Surfaces, Interfaces and Low-Dimensional Systems Contolled at Atomic Level

The platform is provided with Ultra High Vacuum apparatuses (UHV ≤ 10^-10 mbar) that allow the deposition and growth of inorganic and hybrid organic/inorganic systems, controlling thicknesses at the level of the single layer or up to a fraction of it guaranteeing, as well, a high purity of them.