The Leybold LH Z400 is dedicated to the deposition of materials (both metals and oxides) and consists of a high-vacuum chamber and sample holder up to 4 inches.
In this technique, ionized particles due to the activation of a plasma of an inert gas (e.g. Ar) are forced to impact onto a target (the material to be deposited) causing the ejection of atoms and/or molecular clusters, that later will condense on the substrate surface for the coating formation.
This setup is generally used in the deposition of films with thickness > 100 nm, in the fabrication of metal contacts (whether transferred by optical lithography or with shadow mask) and oxide coatings.
TECHNICAL SPECIFICATIONS
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RF and DC generators
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The system is equipped with 3 sputtering targets for deposition of multi-layers
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reactive gas: Ar
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base pressure: 5x10-7 mbar
AVAILABLE TECHNIQUES
- DC sputtering deposition
- RF Sputtering deposition
SAMPLES
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maximum size 4-inch diameter
USE FOR
- metallic contacts;
- engineered multi-layer metal coatings
CASE STUDIES
Diamond spectrometers for fast neutron, arranged as single pixel and multi-pixel matrix, were metallized with the magnetron sputtering to obtain almost-ohmic contacts on diamond, inducing extremely reduced space-charge conditions.
See: C. Cazzaniga, et al., and G. Gorini, A diamond based neutron spectrometer for diagnostics of deuterium-tritium fusion plasmas, Review of Scientific Instruments, 85 (2014) 11E101
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