Consiglio Nazionale delle Ricerche - Istituto di Struttura della Materia

Infrastructures



1. ADES 450  
Description: UPS, XPS and Auger spectrometer for angular revolved study  
Site: ARTOV 
Task: MD.P06.006  
Contact: Antonio Cricenti  

2. UHV thin film deposition system    
Description: UHV deposition system for production thin film. The system has got two chambers, one for film deposition and one fast entry lock.  
Site: MLIB 
Contact: Anna Maria Paoletti  

3. Thin Film XR diffractometer  
Description: Seifert XRD 3003TT  
Site: MLIB 
Contact: Patrizia Imperatori  

4. XR powder diffractometer  
Description: Seifert XRD 3003P   
Site: MLIB 
Contact: Patrizia Imperatori  

5. EDRX    
Description: Energy-Dispersive X-ray Diffractometer  
Site: ARTOV 
Task: MD.P03.006  
Contact: Valerio Rossi Albertini  

6. KSV 2000  
Description: Langmuir-Blodgett instrument for unsupervised deposition of ordered multilayer LB-films on large solid substrates.  
Site: MLIB 
Contact: Aldo Capobianchi  

7. IC11SSL Laboratory    
Description: UHV chamber for surface study  
Site: ARTOV 
Task: MD.P06.005  
Contact: Giorgio Contini  

8. Circular Polarized Beamline    
Description: magnetic circular dichroism in absorption spectroscopy; X-ray photoemission spectroscopy; photoemission spectroscopy from UV to soft X-ray; spin-resolved photoemission; angle-resolved photoemission with high energy resolution.  
Site: Trieste 
Task: MD.P06.005  
Contact: Nicola Zema  

9. VUV Beamline    
Description: High resolution photoemission on core level and valence band; Band and Fermi Surface mapping by angle-resolved photoemission; Absorption in the VUV and soft X-ray range; Photoelectron Diffraction; energy range: 20 eV − 800 eV  
Site: Trieste 
Task: MD.P04.004  
Contact: Carlo Carbone  

10. MBE    
Description: Molecular Beam Epitaxy apparatus for the growth of: MnxGe1-x diluted magnetic semiconductors at various Mn concentrations, Ferromagnetic Mn5Ge3 compound, epitaxial layers and/or dots of Ge/Si, SiGe/Si doped with  
Site: ARTOV 
Task: MD.P04.004  
Contact: Paola De Padova  

11. PDL    
Description: Laser eccimeri KrF (246nm), 300mJ, 50Hz - Camera deposizione HV  
Site: MLIB 
Contact: Elisabetta Agostinelli  

12. SPM    
Description: Scanning Probe Microscopy Laboratory  
Site: ARTOV 
Task: MD.P06.006  
Contact: Antonio Cricenti  

13. EPR Spectrometer    
Description: Varian E-109 Spectrometer, Hmax 1.5 T f= 9.1 and 35 GHz T= 4-300 K   
Site: MLIB 
Contact: Donato Attanasio  

14. FT-IR Spectrometer  
Description: IR-Prestige-21 Shimadzu; wavelength range 7.800 – 350 cm-1;   
Site: MLIB 
Contact: Elvira Maria Bauer  

15. UV-Vis. Spectrometer  
Description: Spectrophotometer 950 Perkin-Elmer; wavelength range 175 – 3300 nm; UV/Vis resolution 0.05 – 5.00 nm; Nir resolution 0.2 – 20 nm  
Site: MLIB 
Contact: Elvira Maria Bauer  

16. SQUID RF     
Description: Hmax 5.5 T; T= 2-300K   
Site: MLIB 
Contact: Alberto Maria Testa  

17. AC-susceptometer  
Description: T=4-300K; f=10Hz-10kHz   
Site: MLIB 
Contact: Dino Fiorani  

18. VSM    
Description: Vibrating Sample Magnetometer (VMS); Hmax 2T; T=70-300K   
Site: MLIB 
Contact: Alberto Maria Testa  

















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Aggiornato il 02-04-2009 - Webmasters: A. Ippoliti, C. Ottaviani, G. Righini - Layout: E. Agostinelli